首页> 外文期刊>Thin Solid Films >Deposition of silicon oxide coatings by atmospheric pressure plasma jet for oxygen diffusion barrier applications
【24h】

Deposition of silicon oxide coatings by atmospheric pressure plasma jet for oxygen diffusion barrier applications

机译:大气压等离子体射流沉积氧化硅涂层,用于氧气扩散阻挡层应用

获取原文
获取原文并翻译 | 示例
           

摘要

Silicon oxide thin-film coated polymer substrates have great applications in the packaging industry for food and medical products, because these types of treated substrates show excellent barrier properties toward oxygen and moisture diffusion. In this work, silicon oxide coatings were fabricated on polyethylene terephthalate and polyimide (PI) substrates by an atmospheric pressure jet. The deposited coatings have been carefully characterized by Fourier transform infrared spectroscopy, scanning electron microscope and atomic force microscope for chemical structures and morphology. The influence of the hexamethyldisiloxane concentration in feed gas and the distance from plasma nozzle to PI substrate is also carefully investigated. With optimized deposition conditions, the obtained silicon oxide coated PI substrates show a satisfactorily low oxygen transmission rate of 0.7 ml/m(2)/day (at 25 degrees C, dry oxygen). (C) 2016 Elsevier B.V. All rights reserved.
机译:涂有氧化硅薄膜的聚合物基材在食品和医疗产品的包装行业中具有很大的应用,因为这些类型的经过处理的基材对氧气和水分的扩散显示出优异的阻隔性能。在这项工作中,通过大气压喷射在聚对苯二甲酸乙二醇酯和聚酰亚胺(PI)基材上制备了氧化硅涂层。沉积的涂层已经通过傅里叶变换红外光谱,扫描电子显微镜和原子力显微镜仔细表征了化学结构和形态。还仔细研究了进料气体中六甲基二硅氧烷浓度的影响以及从等离子喷嘴到PI基材的距离。在优化的沉积条件下,获得的氧化硅涂覆的PI基材显示出令人满意的低氧气透过率,为0.7 ml / m(2)/天(在25摄氏度,干燥氧气)。 (C)2016 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Thin Solid Films》 |2016年第30期|63-68|共6页
  • 作者单位

    Beijing Inst Graph Commun, Beijing Key Lab Printing & Packaging Mat & Techno, Lab Plasma Phys & Mat, Beijing 102600, Peoples R China;

    Beijing Inst Graph Commun, Beijing Key Lab Printing & Packaging Mat & Techno, Lab Plasma Phys & Mat, Beijing 102600, Peoples R China;

    Beijing Inst Graph Commun, Beijing Key Lab Printing & Packaging Mat & Techno, Lab Plasma Phys & Mat, Beijing 102600, Peoples R China;

    Beijing Inst Graph Commun, Beijing Key Lab Printing & Packaging Mat & Techno, Lab Plasma Phys & Mat, Beijing 102600, Peoples R China|Peking Univ, Shenzhen Grad Sch, Sch Adv Mat, Shenzhen 518055, Peoples R China;

    Beijing Inst Graph Commun, Beijing Key Lab Printing & Packaging Mat & Techno, Lab Plasma Phys & Mat, Beijing 102600, Peoples R China;

    Beijing Inst Graph Commun, Beijing Key Lab Printing & Packaging Mat & Techno, Lab Plasma Phys & Mat, Beijing 102600, Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Atmospheric pressure; Barrier film; Plasma jet; Silicon oxide coatings;

    机译:大气压;阻隔膜;等离子流;氧化硅涂层;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号