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Electrical transport properties and morphology of topological insulator Bi2Se3 thin films with different thickness prepared by magnetron sputtering

机译:磁控溅射制备不同厚度拓扑绝缘子Bi2Se3薄膜的电输运性质和形貌

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摘要

Topological insulator Bi2Se3 thin films were grown by magnetron sputtering on Si (1 0 0) substrate and their phase structures and electrical properties were studied. The films have good crystalline quality, and their surfaces exhibited terrace-like quintuple layers. In the high temperature region, contribution from surface carrier and bulk conduction band electrons excited from an impurity band; in the low temperature region, surface electron became dominant. The weak antilocalization (WAL) cusp was observed in the magneto-transport measurement at low temperature under low magnetic field. The linear magnetoresistance (MR) under high-field was found, which was associated with the gapless topological surface states and of quantum origin. Insulating tendency was much stronger in thinner films. The WAL effect became weaker in thicker films. The top surface was only partially decoupled. (C) 2016 Elsevier B.V. All rights reserved.
机译:通过磁控溅射在Si(1 0 0)衬底上生长拓扑绝缘体Bi2Se3薄膜,并研究了它们的相结构和电性能。这些膜具有良好的结晶质量,并且它们的表面表现出梯状的五重层。在高温区,表面载流子和从杂质带激发的体导带电子的贡献;在低温区域,表面电子占主导地位。在低温,低磁场下的磁性传输测量中观察到了弱的反局部化(WAL)尖端。发现了高场下的线性磁阻(MR),其与无间隙拓扑表面态和量子起源有关。在较薄的薄膜中,绝缘趋势要强得多。在较厚的薄膜中,WAL效应变弱。顶表面仅部分解耦。 (C)2016 Elsevier B.V.保留所有权利。

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  • 来源
    《Thin Solid Films》 |2016年第31期|289-293|共5页
  • 作者单位

    Southwest Jiaotong Univ, Minist Educ, Superconduct & New Energy R&D Ctr, Key Lab Adv Technol Mat, Mail Stop 165, Chengdu 610031, Sichuan, Peoples R China;

    Southwest Jiaotong Univ, Minist Educ, Superconduct & New Energy R&D Ctr, Key Lab Adv Technol Mat, Mail Stop 165, Chengdu 610031, Sichuan, Peoples R China;

    Southwest Jiaotong Univ, Minist Educ, Superconduct & New Energy R&D Ctr, Key Lab Adv Technol Mat, Mail Stop 165, Chengdu 610031, Sichuan, Peoples R China;

    Southwest Jiaotong Univ, Minist Educ, Superconduct & New Energy R&D Ctr, Key Lab Adv Technol Mat, Mail Stop 165, Chengdu 610031, Sichuan, Peoples R China;

    Southwest Jiaotong Univ, Minist Educ, Superconduct & New Energy R&D Ctr, Key Lab Adv Technol Mat, Mail Stop 165, Chengdu 610031, Sichuan, Peoples R China;

    Southwest Jiaotong Univ, Minist Educ, Superconduct & New Energy R&D Ctr, Key Lab Adv Technol Mat, Mail Stop 165, Chengdu 610031, Sichuan, Peoples R China;

    Southwest Jiaotong Univ, Minist Educ, Superconduct & New Energy R&D Ctr, Key Lab Adv Technol Mat, Mail Stop 165, Chengdu 610031, Sichuan, Peoples R China;

    Southwest Jiaotong Univ, Minist Educ, Superconduct & New Energy R&D Ctr, Key Lab Adv Technol Mat, Mail Stop 165, Chengdu 610031, Sichuan, Peoples R China|Univ New S Wales, Sch Mat Sci & Engn, Sydney, NSW 2052, Australia;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Topological insulator; Thickness; Weak antilocalization;

    机译:拓扑绝缘体;厚度;弱局部化;

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