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Ferroelectric memory resistive behavior in BaTiO3/Nb doped SrTiO3 heterojunctions

机译:BaTiO3 / Nb掺杂SrTiO3异质结中的铁电记忆电阻行为

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摘要

We present the memristive (memory resistive) behavior in two different pulsed laser deposited BaTiO3/Nb doped SrTiO3 junctions. The first junction is controlled by space charge limited current (SCLC) conduction while the post-annealed junction is dominated by Schottky emission. The latter junction displays better ferroelectric and memristive properties (with an order of magnitude higher OFF/ON resistance ratio) as compared to the former junction with SCLC conduction. We attribute the improved behavior of the latter junction to the reduction of oxygen vacancies due to post-annealing of the film. (C) 2017 Elsevier B.V. All rights reserved.
机译:我们介绍了两种不同的脉冲激光沉积BaTiO3 / Nb掺杂SrTiO3结中的忆阻(记忆电阻)行为。第一个结由空间电荷限制电流(SCLC)传导控制,而后退火结则由肖特基发射控制。与具有SCLC导通的前一个结相比,后一个结显示出更好的铁电和忆阻特性(OFF / ON电阻比高一个数量级)。我们将后者接合处的改善行为归因于薄膜的后退火处理,从而减少了氧空位。 (C)2017 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Thin Solid Films》 |2017年第1期|60-64|共5页
  • 作者单位

    Acad Sci & Innovat Res AcSIR, CSIR NPL Campus,Dr KS Krishnan Marg, New Delhi 110012, India|CSIR, Natl Phys Lab, Dr KS Krishnan Marg, New Delhi 110012, India;

    CSIR, Natl Phys Lab, Dr KS Krishnan Marg, New Delhi 110012, India;

    CSIR, Natl Phys Lab, Dr KS Krishnan Marg, New Delhi 110012, India;

    Acad Sci & Innovat Res AcSIR, CSIR NPL Campus,Dr KS Krishnan Marg, New Delhi 110012, India|CSIR, Natl Phys Lab, Dr KS Krishnan Marg, New Delhi 110012, India;

    Acad Sci & Innovat Res AcSIR, CSIR NPL Campus,Dr KS Krishnan Marg, New Delhi 110012, India|CSIR, Natl Phys Lab, Dr KS Krishnan Marg, New Delhi 110012, India;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    Barium titanate; Memory resistor; Schottky emission; Space charge limited conduction; Pulsed laser deposition;

    机译:钛酸钡;记忆电阻器;肖特基发射;空间电荷受限传导;脉冲激光沉积;

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