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Effect of Zr content on structure property relations of Ni-Zr alloy thin films with mixed nanocrystalline and amorphous structure

机译:Zr含量对纳米晶与非晶态混合Ni-Zr合金薄膜结构性能关系的影响

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摘要

A comparative study has been carried out on microstructural evolution, surface roughness, nanoindentation and scratch behavior, electrical resistivity, and corrosion resistance of Ni1-xZrx(0.13 ≤ x ≤ 0.40) thin films deposited on Si-(100) substrate by DC magnetron co-sputtering of high purity elemental targets in argon atmosphere. The film compositions have been examined by energy dispersive X-ray and Auger electron spectroscopy. Grazing incidence X-ray diffraction (GIXRD) studies have shown presence of Ni-rich solid solution, Ni3Zr and amorphous phase in all the films, with Ni5Zr being additionally observed in the Ni87Zr13film. Analysis of GIXRD data along with transmission electron microscopic studies have shown that volume fractions of both amorphous phase and Ni3Zr are increased, whereas the average crystallite size is decreased with increase in Zr concentration. Nanoindentation hardness and Young's modulus as well as electrical resistivity measured by Van-der Pauw four-probe method are influenced by volume fractions of both Ni3Zr and amorphous phase. Surface roughness and coefficient of friction obtained from atomic force microscopy and nano-scratch experiments, respectively decrease, whereas corrosion resistance in 3.5 wt% NaCl solution increase with Zr concentration primarily due to increase in amorphous phase content. Resistance to pitting corrosion is facilitated by formation of ZrO2-rich passive film, as confirmed by X-ray photoelectron spectroscopy.
机译:对直流磁控管沉积在Si-(100)上的Ni1-xZrx(0.13≤xx≤0.40)薄膜的微观结构演变,表面粗糙度,纳米压痕和划痕行为,电阻率和耐蚀性进行了比较研究。在氩气氛中溅射高纯度元素靶。通过能量色散X射线和俄歇电子能谱检查了膜的组成。掠入射X射线衍射(GIXRD)研究表明,在所有膜中都存在富镍固溶体,Ni3Zr和非晶相,在Ni87Zr13膜中还观察到Ni5Zr。对GIXRD数据的分析以及透射电子显微镜研究表明,非晶相和Ni3Zr的体积分数均增加,而平均晶粒尺寸随Zr浓度的增加而减小。 Ni3Zr和非晶相的体积分数会影响通过Van-der Pauw四探针法测得的纳米压痕硬度和杨氏模量以及电阻率。由原子力显微镜和纳米划痕实验获得的表面粗糙度和摩擦系数分别降低,而在3.5 wt%NaCl溶液中的耐蚀性随Zr浓度的增加而增加,这主要是由于非晶相含量的增加。 X射线光电子能谱证实,形成富含ZrO2的钝化膜有助于增强抗点蚀的能力。

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