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Tuning electronic properties of silicane layers by tensile strain and external electric field: A first-principles study

机译:通过拉伸应变和外部电场调节硅酮层的电子性能:第一性原理研究

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摘要

The structural and electronic properties of silicane layers and bulk, the effects of a biaxial tensile strain and an external electric field (E-field) on the electronic properties of silicane monolayer and bilayer are investigated using density functional theory computations with the van der Waals (vdW) correction. It is demonstrated that the weak vdW interaction between silicane layers can efficiently tune the electronic properties of silicane multilayers. The silicane multilayers (up to 5) are indirect bandgap semiconductors whose bandgap slightly decreases with the number of layers, whereas bulk silicane is a direct bandgap semiconductor. The bandgaps of both silicane monolayer and bilayer can be flexibly modulated by applying a biaxial tensile strain, and indirect-direct transition occurs when the biaxial tensile strain reaches 4% and 2% respectively. Besides, the bandgaps of the silicane monolayer and bilayer can also be continuously modulated by an external E-field, with an indirect-direct transition observed when its magnitude reaches 0.5 and 0.7 V/angstrom respectively. A larger E-field can trigger semiconductor-metal transition at approximately 0.8 V/angstrom for both silicane monolayer and bilayer. Our results provide rather effective and flexible approaches to tuning the electronic properties of silicane layers for application in silicane-based electronic and optoelectronic devices.
机译:硅酮层和块体的结构和电子性质,双轴拉伸应变和外电场(E场)对硅酮单层和双层电子性质的影响是使用范德华(van der Waals)进行的密度泛函理论计算( vdW)更正。结果表明,硅酮层之间的弱vdW相互作用可以有效地调节硅酮多层膜的电子性能。硅酮多层膜(最多5个)是间接带隙半导体,其带隙随层数的增加而略有减小,而块状硅酮是直接带隙半导体。可以通过施加双轴拉伸应变来灵活地调节硅单分子层和双层的带隙,并且当双轴拉伸应变分别达到4%和2%时会发生间接转换。此外,硅酮单层和双层的带隙也可以通过外部电场连续调节,当其幅度分别达到0.5和0.7 V /埃时,可以观察到间接-直接过渡。对于硅单层和双层,较大的电场可触发半导体金属跃迁速度约为0.8 V /埃。我们的结果提供了相当有效和灵活的方法来调整用于基于硅的电子和光电设备中的硅层的电子性能。

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