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首页> 外文期刊>Thin Solid Films >Effects of tin-doping on cadmium sulfide (CdS:Sn) thin-films grown by light-assisted chemical bath deposition process for solar photovoltaic cell
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Effects of tin-doping on cadmium sulfide (CdS:Sn) thin-films grown by light-assisted chemical bath deposition process for solar photovoltaic cell

机译:锡掺杂对光化学浴沉积太阳能光伏电池生长硫化镉(CdS:Sn)薄膜的影响

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摘要

Thin transparent films of tin-doped cadmium sulfide (CdS) on different substrates were obtained by an ammoniafree chemical bath deposition technique assisted by ultraviolet illumination with a wavelength of 265 nm. Several sets of films were deposited by varying the amount of SnCl2 in the reaction bath and analyzed by X-ray diffraction, scanning electron microscopy, optical transmission and reflection spectroscopy and current versus voltage measurements. In the doped films, the position of the main X-ray diffraction peak is shifted to larger angles showing a decrease of the crystal lattice constant; this is attributed to the substitution of tin by cadmium in the doping process. The morphological characterization of the doped films shows homogeneously distributed spherical grains with an average grain size of 58.5 nm. The grains are composed of crystallites with an average size of 23 nm; the surface of the doped films does not show conglomerates that are typical for materials grown by the chemical bath deposition technique. The electrical properties reveal a decrement in the resistivity of an order of magnitude with respect to the films without doping. The optical results exhibit variation in the band gap that we consider as the consequence of the films' porosity; the theoretical analysis presented confirms this point. The films show a reflectance at a normal incidence less than 30%, which is an indication of their good optical quality. The main effects of the tin doping on the CdS films were observed as changes in the crystal structure and electrical resistivity.
机译:通过无氨化学浴沉积技术,辅以波长为265 nm的紫外线照射,获得了不同基板上的掺锡硫化镉(CdS)透明薄膜。通过改变反应浴中SnCl2的量来沉积几组薄膜,并通过X射线衍射,扫描电子显微镜,光学透射和反射光谱以及电流对电压测量进行分析。在掺杂的膜中,主X射线衍射峰的位置移到更大的角度,这表明晶格常数减小。这归因于在掺杂过程中锡被镉替代。掺杂膜的形态表征显示出均匀分布的球形晶粒,平均晶粒尺寸为58.5 nm。晶粒由平均尺寸为23 nm的微晶组成。掺杂膜的表面没有显示出通过化学浴沉积技术生长的材料通常具有的团块。相对于未掺杂的膜,电性能显示出电阻率降低了一个数量级。光学结果显示出带隙的变化,我们认为这是薄膜孔隙率的结果。提出的理论分析证实了这一点。这些膜在法向入射时的反射率小于30%,这表明它们的光学质量良好。观察到锡掺杂对CdS膜的主要影响是晶体结构和电阻率的变化。

著录项

  • 来源
    《Thin Solid Films》 |2018年第1期|341-349|共9页
  • 作者单位

    CINVESTAV Queretaro, Libramiento Norponiente 2000, Queretaro 76230, Qro, Mexico;

    Univ Texas Dallas, Mat Sci & Engn, Richardson, TX 75083 USA;

    CINVESTAV Queretaro, Libramiento Norponiente 2000, Queretaro 76230, Qro, Mexico;

    CIMAV Monterrey, Alianza Norte 202,Parque Invest & Innovac Tecnol, Apodaca 66628, NL, Mexico;

    CINVESTAV Queretaro, Libramiento Norponiente 2000, Queretaro 76230, Qro, Mexico;

    CINVESTAV Queretaro, Libramiento Norponiente 2000, Queretaro 76230, Qro, Mexico;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    CBD; CdS films; CdS/Si; Sn doping;

    机译:CBD;CdS薄膜;CdS / Si;Sn掺杂;

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