Fluorine doped titanium dioxide films manufactured with the help of plasma enhanced chemical vapor deposition technique

摘要

In this work, a manufacture of TiO2 coatings doped with fluorine, in a concentration range of 0.6 to 6.7 at.%, is presented. The coatings were deposited onto silicon and quartz substrates with the help of radio frequency plasma enhanced chemical vapor deposition technique. They were characterized with regard to their elemental composition, chemical structure, phase composition, surface topography, optical properties, photo-wettability and bactericidal properties. For that purpose, such analytical techniques as X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy, grazing incidence X-ray diffraction (GIXRD), scanning electron microscopy, atomic force microscopy, ultraviolet-visible absorption spectroscopy and variable angle spectroscopic ellipsometry were used.