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Optimisation of the envelope method for characterisation of optical thin film on substrate specimens from their normal incidence transmittance spectrum

机译:通过法向入射透射光谱优化表征样品上光学薄膜的包络线方法

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摘要

The spectroscopic ellipsometry is the main tool for optical characterisation of a thin film in its spectral region of strong absorption, where its transmittance spectrum does not contain interference pattern. The envelope method (EM) is the main tool for accurate optical characterisation of a thin film with thickness typically in the range [500, 5000] nm on a substrate, in the spectral regions of medium and weak absorption and quasi-transparency of the film, where interference pattern is observed in the transmittance spectrum T(lambda) of the film on substrate specimen. However, the EM algorithms have been devised and verified only for films with a wide spectral region of quasi-transparency. Moreover, the performance of the most credible EM algorithm assuming non-uniform film thickness contains three subjectively chosen parameters Delta d, N-1, and N-2. The optimised EM algorithm (OEM algorithm) proposed here for the optimisation of EM, accurately characterises both quasi-transparent and absorbing films, and computes optimised values of Delta d, N-1, and N-2. This is achieved by the correct differentiation of the film absorption from thickness non-uniformity in the film, and minimisation of the value of an error metric introduced to assess the film characterisation error. The OEM algorithm is validated for four model specimens, using films with dissimilar absorption and non-uniformity. Results are presented for film characterisation using both the EM algorithm and the OEM algorithm, for two specimens containing a-Si films with dissimilar film thicknesses. A comparison with thickness measurements by scanning electron microscope shows that using the EM algorithm leads to errors in the average film thickness (d) over bar of 25% and 38% for these a-Si films, due to the incorrect ascribing of film absorption to additional non-uniformity in film thickness. In contrast, an analysis of the characterisation results using the OEM algorithm indicates that (d) over bar is computed with an error of 0.1%, and the refractive index error is 0.15%. Using the OEM algorithm virtually guarantees accurate film characterisation in the wavelength region containing interference pattern of T(lambda), regardless of whether the film has or does not have a wide spectral region of quasi-transparency, as well as whether the film is uniform or non-uniform.
机译:椭圆偏振光谱法是在强吸收光谱区域中光学表征薄膜的主要工具,该薄膜的透射光谱不包含干涉图样。包络法(EM)是用于准确光学表征薄膜的光学特性的主要工具,该薄膜的厚度通常在基质的中度和弱吸收性和准透明性的光谱区域中,厚度通常在[500,5000] nm范围内,其中在基材样品上薄膜的透射光谱T(λ)中观察到干涉图样。但是,仅针对具有宽半透明光谱范围的胶片设计和验证了EM算法。此外,假设膜厚度不均匀的最可靠EM算法的性能包含三个主观选择的参数Delta d,N-1和N-2。此处提出的用于优化EM的优化EM算法(OEM算法),可准确表征准透明和吸收膜,并计算Delta d,N-1和N-2的优化值。这是通过正确区分薄膜吸收与薄膜厚度不均匀性以及使评估薄膜表征误差引入的误差度量值最小化来实现的。使用具有不同吸收和不均匀性的薄膜,对四个模型样本的OEM算法进行了验证。给出了使用EM算法和OEM算法对两个包含不同膜厚的a-Si膜的样品进行膜表征的结果。与通过扫描电子显微镜测得的厚度进行比较,结果表明,使用EM算法会导致这些a-Si膜的平均膜厚(d)超过25%和38%的条形误差,这是由于膜吸收不正确导致的。膜厚的其他不均匀性。相反,使用OEM算法对表征结果进行的分析表明,计算出的条形图(d)的误差为0.1%,折射率误差为0.15%。使用OEM算法实际上可以确保在包含T(λ)干涉图样的波长区域内进行准确的薄膜表征,无论薄膜是否具有宽的准透明光谱区域,以及薄膜是否均匀或不透明。不均匀

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