机译:衬底旋转下射频磁控溅射掠角沉积ZrO_2薄膜的研究。
Bhabha Atom Res Ctr, Atom & Mol Phys Div, Mumbai 400085, Maharashtra, India;
Bhabha Atom Res Ctr, Atom & Mol Phys Div, Mumbai 400085, Maharashtra, India;
Bhabha Atom Res Ctr Facil, Atom & Mol Phys Div, Photon & Nanotechnol Sect, Visakhapatnam 530012, Andhra Pradesh, India;
Bhabha Atom Res Ctr Facil, Atom & Mol Phys Div, Photon & Nanotechnol Sect, Visakhapatnam 530012, Andhra Pradesh, India;
Indira Gandhi Ctr Atom Res, Kalpakkam 603102, Tamil Nadu, India;
Bhabha Atom Res Ctr Facil, Atom & Mol Phys Div, Photon & Nanotechnol Sect, Visakhapatnam 530012, Andhra Pradesh, India;
Bhabha Atom Res Ctr, Atom & Mol Phys Div, Mumbai 400085, Maharashtra, India;
Bhabha Atom Res Ctr, Atom & Mol Phys Div, Mumbai 400085, Maharashtra, India;
BARC, Natl Ctr Composit Characterizat Mat, Hyderabad 500062, Andhra Pradesh, India;
Bhabha Atom Res Ctr, Atom & Mol Phys Div, Mumbai 400085, Maharashtra, India;
Glancing angle deposition; Zirconium dioxide; Thin films; Ellipsometry; Atomic force microscopy; Grazing incidence X-ray diffraction; Residual stress;
机译:掠射角沉积下靶材到衬底距离变化的射频磁控溅射沉积氧化ha薄膜的研究
机译:射频磁控溅射在不同衬底温度下沉积的Al掺杂ZnO薄膜的表面和体电子性能之间的关系
机译:Mo的光电性和各向异性应力:射频磁控溅射沉积在柔性基板上的ZnO薄膜
机译:射频磁控溅射在不同衬底温度下沉积的纳米结构氧化锌薄膜的光学性质
机译:射频磁控溅射砷化镓薄膜的光学表征。
机译:在不加热衬底的情况下通过射频磁控等离子体溅射沉积的铝掺杂氧化锌薄膜的空间分辨光电性能
机译:纳米结构WO3薄膜通过瞥见角度磁控溅射沉积