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Influence of compactness and formation of metallic secondary phase on the thermoelectric properties of Cu_2ZnSnS_4 thin films

机译:致密性和金属第二相的形成对Cu_2ZnSnS_4薄膜热电性能的影响

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摘要

Thermoelectric studies of Cu2ZnSnS4 (CZTS) thin films deposited at different substrate temperatures by ultrasonic assisted chemical vapor deposition technique have been carried out. In order to identify the effect of compactness, crystallinity and formation of secondary phases (Cu-2 (-) S-x and SnS2) on the thermoelectric properties of CZTS thin films, the films were deposited at different substrate temperatures. Detailed analysis of temperature dependent electrical resistivity (rho) and Seebeck coefficient (S) have been carried out. Significant enhancement in the value of thermoelectric power factor (S-2/rho) is achieved in CZTS film deposited at 375 degrees C substrate temperature, which is correlated to the compactness of thin films, improved crystallinity and presence of metallic secondary phase. Furthermore, Surface topography and surface potential studies also carried out to study the roughness and distribution of interfaces between CZTS and secondary phases (Cu2 - S-x and SnS2) in CZTS thin films.
机译:已经对通过超声辅助化学气相沉积技术在不同衬底温度下沉积的Cu2ZnSnS4(CZTS)薄膜进行了热电研究。为了确定致密性,结晶度和第二相(Cu-2(-)S-x和SnS2)的形成对CZTS薄膜热电性能的影响,在不同的基板温度下沉积了这些膜。已经对与温度有关的电阻率(rho)和塞贝克系数(S)进行了详细分析。在基板温度为375摄氏度下沉积的CZTS膜中,热电功率因数(S-2 / rho)值得到了显着提高,这与薄膜的致密性,改善的结晶度和金属第二相的存在有关。此外,还进行了表面形貌和表面电势研究,以研究CZTS薄膜与CZTS薄膜中次级相(Cu2-S-x和SnS2)之间的界面粗糙度和分布。

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