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The impact of humidity and film thickness on photoemission, optical and morphological properties of Csl thin film photocathodes

机译:湿度和膜厚对Csl薄膜光电阴极的光发射,光学和形态特性的影响

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In this research, we report the effect of humidity and film thickness on the photoemission, optical and morphological properties of CsI thin films prepared by the thermal evaporation technique. The absolute quantum efficiency of CsI thin films has been obtained by using photoemission measurement in the spectral range of 150 nm-200 nm. The degradation in quantum efficiency of CsI thin films under the influence of humidity has been presented. The optical reflectance and transmittance of CsI thin films have been measured directly in the 120 nm-240 nm spectral range. The optical constants have been found to vary with film thickness. The transparency of CsI films has been decreased after exposing to humidity. In contrast, the reflectivity has been increased. The optical band gap energy has been calculated by using Kubelka-Munk (K. M.) model and from first derivative of absorbance. It has been found that the band gap energies obtained from the first derivative of absorbance are slightly higher than those obtained from K. M. model. The average grain size obtained from scanning electron microscopy (SEM) and atomic force microscopy (AFM) techniques are observed to be almost similar (similar to 170 nm) for the thinner films, however for the thicker films the average grain size obtained by SEM technique is three times larger (similar to 1500 nm) than those obtained by AFM technique (similar to 550 nm). Various morphological parameters such as maximum peak to valley height, average height, average roughness and root mean square of CsI thin films analyzed from AFM technique are observed to increase after exposing to humidity.
机译:在这项研究中,我们报告了湿度和膜厚对通过热蒸发技术制备的CsI薄膜的光发射,光学和形貌特性的影响。 CsI薄膜的绝对量子效率已通过在150 nm至200 nm光谱范围内使用光发射测量获得。已经提出了在湿度的影响下CsI薄膜的量子效率的降低。 CsI薄膜的光学反射率和透射率已直接在120 nm-240 nm光谱范围内测量。已经发现光学常数随膜厚度而变化。暴露于湿气后,CsI膜的透明度降低了。相反,反射率已经增加。通过使用Kubelka-Munk(K.M.)模型和吸光度的一阶导数计算出光学带隙能量。已经发现,从吸光度的一阶导数获得的带隙能量略高于从K.M.模型获得的带隙能量。对于较薄的薄膜,观察到通过扫描电子显微镜(SEM)和原子力显微镜(AFM)技术获得的平均晶粒尺寸几乎相似(类似于170 nm),但是对于较厚的薄膜,通过SEM技术获得的平均晶粒尺寸是通过AFM技术(类似于550 nm)获得的三倍大(近似于1500 nm)。观察到通过AFM技术分析的CsI薄膜的各种形态参数,例如最大峰谷高度,平均高度,平均粗糙度和均方根,在暴露于湿气之后增加。

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