机译:2-巯基吡啶和Janus Green B作为整平剂对互连用电沉积铜薄膜电阻的影响
Shanghai Jiao Tong Univ, Key Lab Thin Film & Microfabricat Technol, Minist Educ, State Key Lab Met Matrix Composites,Sch Mat Sci &, Shanghai 200240, Peoples R China;
Shanghai Jiao Tong Univ, Key Lab Thin Film & Microfabricat Technol, Minist Educ, State Key Lab Met Matrix Composites,Sch Mat Sci &, Shanghai 200240, Peoples R China;
Shanghai Jiao Tong Univ, Key Lab Thin Film & Microfabricat Technol, Minist Educ, State Key Lab Met Matrix Composites,Sch Mat Sci &, Shanghai 200240, Peoples R China;
Shanghai Jiao Tong Univ, Key Lab Thin Film & Microfabricat Technol, Minist Educ, State Key Lab Met Matrix Composites,Sch Mat Sci &, Shanghai 200240, Peoples R China;
Shanghai Jiao Tong Univ, Key Lab Thin Film & Microfabricat Technol, Minist Educ, State Key Lab Met Matrix Composites,Sch Mat Sci &, Shanghai 200240, Peoples R China;
Shanghai Jiao Tong Univ, Key Lab Thin Film & Microfabricat Technol, Minist Educ, State Key Lab Met Matrix Composites,Sch Mat Sci &, Shanghai 200240, Peoples R China;
Shanghai Jiao Tong Univ, Key Lab Thin Film & Microfabricat Technol, Minist Educ, State Key Lab Met Matrix Composites,Sch Mat Sci &, Shanghai 200240, Peoples R China;
2-mercaptopyridine; Janus Green B; Levelers; Copper electrodeposition; Sheet resistance;
机译:铜掺杂电沉积MOO3薄膜的光学,电气和磁性性能
机译:2-巯基吡啶作为一种新的整平剂,用于自下而上填充铜电镀中的微孔
机译:由于等温老化,表面氧化和界面金属间化合物的生长对铜基板上电沉积锡薄膜可焊性降低的综合影响
机译:不含增白剂/矫平剂的电子互连件的电介脉冲反向镀铜
机译:添加剂对电沉积铜纳米结构和薄膜成核和生长动力学的影响
机译:光辅助电沉积对CuInSe2薄膜的影响
机译:添加剂对电沉积铜纳米结构和薄膜成核和生长动力学的影响