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首页> 外文期刊>Thin Solid Films >Influence of metal magnetic state and metal-insulator-semiconductor structure composition on magnetoimpedance effect caused by interface states
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Influence of metal magnetic state and metal-insulator-semiconductor structure composition on magnetoimpedance effect caused by interface states

机译:金属磁态和金属-绝缘体-半导体结构组成对界面态引起的磁阻效应的影响

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This article presents the results of a study of the transport properties of metal/insulator/semiconductor (MIS) hybrid structures in alternating current (ac) mode. We prepared a series of samples with different layers of metal, insulator, and semiconductor. We prepared a series of samples with different layers of metal, insulator and semiconductor. Ferromagnetic Fe and non-magnetic Cu and Mn were chosen as metals, the insulators were SiO2 and Al2O3, and n- and p-type Si substrates were used as semiconductors. Temperature dependence of the real part of the impedance showed peculiar peaks below 40K for different combinations of metals, insulators and semiconductors. For all samples the effect of the magnetic field on the transport properties was studied. At low temperatures, the magnetic field shifts peaks toward higher temperatures. Metal magnetic state does not significantly affect this phenomenon. Changing the type of the insulator and its thickness also did not cause any significant effect. However, the effect was observed for samples with different composition. Moreover, the type of conductivity of the substrate, as well as the type of metal, determines the value of magnetoimpedance. The main role in the magnetoimpedance effect is played by recharge of the energy states localized at the insulator/ semiconductor interface. This mechanism allows obtaining a MI effect even in "nonmagnetic" MIS structures; magnetoimpedance can be either positive or negative, depending on temperature and frequency. We suggest that the observed ac magnetotransport phenomena could be used for creating magnetic field sensors, working on new principles.
机译:本文介绍了在交流(ac)模式下对金属/绝缘体/半导体(MIS)混合结构的传输特性进行研究的结果。我们准备了一系列具有不同金属,绝缘体和半导体层的样品。我们准备了一系列具有不同金属,绝缘体和半导体层的样品。选择铁磁性的Fe和非磁性的Cu和Mn作为金属,绝缘体是SiO2和Al2O3,n型和p型Si衬底用作半导体。对于金属,绝缘体和半导体的不同组合,阻抗实部的温度依赖性显示出低于40K的奇特峰。对于所有样品,都研究了磁场对传输性能的影响。在低温下,磁场会将峰值移向更高的温度。金属磁性状态不会显着影响此现象。改变绝缘子的类型及其厚度也不会产生任何明显的影响。然而,对于具有不同组成的样品观察到了这种效果。此外,基板的导电类型以及金属的类型决定了磁阻值。磁阻效应中的主要作用是通过重新定位在绝缘体/半导体界面处的能态来实现的。这种机制即使在“非磁性” MIS结构中也可以获得MI效果。磁阻可以为正也可以为负,具体取决于温度和频率。我们建议,观察到的交流磁传输现象可用于创建磁场传感器,并采用新原理。

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