The W(90%)-Ti(10%) wt% alloy target is prepared and the W-Ti thin films are deposited by the dc Ar+ sputtering on silicon substrates. The morphology, composition, and microstructure of the alloy and thin films were observed. The structure was undertaken using X-ray diffraction (XRD). The morphology was determined by scanning electron microscopy with energy dispersive spectrometer (SEM-EDS) and high-resolution transmission electron microscopy (HRTEM). The surface composition and chemical bonding of elements on the Ti-W thin films after deposition and exposed to air were analyzed by X-ray photoelectron spectroscopy (XPS). The results show the structure evolves from amorphous film to dual phase (bcc W and bcc Ti) followed by uniform ?2-phase solid solution with increasing sputtering power. The sputtering power and bias voltage also have great effect on the resistivity of the W-Ti thin films.View full textDownload full textKeywordsamorphous, phase structure, sheet resistivity, W-10wt.%Ti alloy, W-Ti thin filmsRelated var addthis_config = { ui_cobrand: "Taylor & Francis Online", services_compact: "citeulike,netvibes,twitter,technorati,delicious,linkedin,facebook,stumbleupon,digg,google,more", pubid: "ra-4dff56cd6bb1830b" }; Add to shortlist Link Permalink http://dx.doi.org/10.1080/15533174.2011.615038
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