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Understanding the electronic properties of molecule/metal junctions: The case study of thiols on gold

机译:了解分子/金属结的电子性质:以金上的硫醇为例

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In this work, I review our recent results on the electronic properties of thiolate/metal interface. Work function change, molecular level alignment and interfacial state formation of the methylthiolate/ Au(111) and dimethyl-disulfide/Au(111) interfaces are investigated by means of UPS and XPS. A complete picture of the electronic properties of both the dimethyl-disulfide (DMDS) weakly-adsorbed and the methylthiolate (MT) chemisorbed phases is obtained by direct quantitative comparison between the experiment and theory. The modifications of the electronic properties of the DMDS thin film, induced by a MT buffer layer are also discussed.rnMoreover, the cysteine/Au(111) system is investigated as an example of interface formed by molecules with large intrinsic dipole moment. Finally, surface inhomogeneity and its influence on the interface electronic properties is briefly discussed, in light of the important concept of local work function.
机译:在这项工作中,我回顾了我们最近关于硫醇盐/金属界面电子特性的结果。通过UPS和XPS研究了甲基硫醇盐/ Au(111)和二甲基二硫化物/ Au(111)界面的功函数变化,分子能级排列和界面态形成。通过实验和理论之间的直接定量比较,可以得到弱吸附的二甲基二硫化物(DMDS)和甲基硫醇盐(MT)化学吸附相的电子性质的完整图片。还讨论了由MT缓冲层引起的DMDS薄膜电子性能的改变。此外,以半胱氨酸/ Au(111)系统为例,说明了具有大固有偶极矩的分子形成的界面。最后,根据局部功函数的重要概念,简要讨论了表面不均匀性及其对界面电子性能的影响。

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