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Strain-induced pseudo-magnetic fields and charging effects on CVD-grown graphene

机译:应变诱发的伪磁场及其对CVD生长的石墨烯的带电效应

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摘要

Atomically resolved imaging and spectroscopic characteristics of graphene grown by chemical vapor deposition (CVD) on copper are investigated by means of scanning tunneling microscopy and spectroscopy (STM/STS). For CVD-grown graphene remaining on the copper substrate, the monolayer carbon structures exhibit ripples and appear strongly strained, with different regions exhibiting different lattice structures and electronic density of states (DOS). In particular, ridges appear along the boundaries of different lattice structures, which exhibit excess charging effects. Additionally, the large and non-uniform strain induces pseudo-magnetic field up to ~50 T, as manifested by the DOS peaks at quantized energies that correspond to pseudo-magnetic field-induced integer and fractional Landau levels. In contrast, for graphene transferred from copper to SiO_2 substrates after the CVD growth, the average strain on the whole diminishes, so do the corresponding charging effects and pseudo-magnetic fields except for sample areas near topological defects. These findings suggest feasible nano-scale "strain engineering" of the electronic states of graphene by proper design of the substrates and growth conditions.
机译:通过扫描隧道显微镜和光谱学(STM / STS)研究了通过化学气相沉积(CVD)在铜上生长的石墨烯的原子分辨成像和光谱学特征。对于残留在铜基板上的CVD生长的石墨烯,单层碳结构表现出波纹并表现出强烈的应变,不同的区域表现出不同的晶格结构和电子态密度(DOS)。尤其是,脊沿着不同晶格结构的边界出现,这表现出过量的带电效应。此外,大而不均匀的应变会感应出高达〜50 T的伪磁场,这是通过量化能量处的DOS峰所证明的,该能量对应于伪磁场引起的整数和分数Landau能级。相比之下,对于在CVD生长后从铜转移到SiO_2衬底的石墨烯,整体上的平均应变减小,除了拓扑缺陷附近的样品区域外,相应的带电效应和伪磁场也减小。这些发现表明,通过适当设计基底和生长条件,可以对石墨烯的电子状态进行纳米级的“应变工程”。

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