Effects of deposition temperatures on laser damage threshold of TiO₂/SiO₂ high reflectors

摘要

TiO₂ single layers and TiO₂/SiO₂ high reflectors are prepared by electron beam evaporation at different TiO₂ deposition temperatures. It is found that the changes of properties of TiO₂ films with the increase in deposition temperature, such as the appearance of anatase crystal, the increase in refractive index and extinction coefficient and the decrease in physical thickness, leads to the spectrum shift and reflectivity bandwidth broadening of high reflectors together with the increase in scattering and absorption and the decrease in laser induced damage threshold.