机译:氮掺杂对磁控溅射氮化镓发光二极管铟锡氧化物薄膜结构,光学和电学性能的影响
Key Laboratory of Beam Technology and Material Modification of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China ,Beijing North Microelectronics Company Limited, Beijing 100176, China;
Key Laboratory of Beam Technology and Material Modification of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China;
Beijing North Microelectronics Company Limited, Beijing 100176, China;
Key Laboratory of Beam Technology and Material Modification of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China;
Key Laboratory of Beam Technology and Material Modification of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China;
Beijing North Microelectronics Company Limited, Beijing 100176, China;
Indium tin oxide; Nitrogen doping; Magnetron sputtering; X-ray photoelectron spectroscopy; High resolution transmission electron mi-croscope; Gallium nitride based light emitting diodes;
机译:铟的添加和后退火对直流磁控溅射沉积镓掺杂氧化锌薄膜的结构,电学和光学性能的影响
机译:脉冲直流磁控溅射法制备的有机发光二极管阳极材料氧化铟锡(ITO)薄膜的电学和表面性能
机译:同时射频射频磁控共溅射在p型氮化镓上生长的In掺杂氧化锌纳米结构薄膜的结构,形态和电学性质
机译:RF磁控溅射制备的铟和铝掺杂氧化锌膜的电气和光学性质
机译:氧化锌发光二极管,氧化铟锌薄膜晶体管和氮化铝镓/氮化镓高电子迁移率晶体管基生物传感器的制造与表征。
机译:射频磁控溅射制备(MgAl)共掺杂ZnO薄膜的光电性能研究与研究
机译:磁控溅射制备氟掺杂氧化锡薄膜的电学和光学性质