Design of phononic materials/structures for surface wave devices using topology optimization

摘要

We develop a topology optimization approach to design two- and three-dimensional phononic (elastic) materials, focusing primarily on surface wave filters and waveguides. These utilize propagation modes that transmit elastic waves where the energy is contained near a free surface of a material. The design of surface wave devices is particularly attractive given recent advances in nano- and micromanufacturing processes, such as thin-film deposition, etching, and lithography, which make it possible to precisely place thin film materials on a substrate with submicron feature resolution. We apply our topology optimization approach to a series of three problems where the layout of two materials (silicon and aluminum) is sought to achieve a prescribed objective: (1) a grating to filter bulk waves of a prescribed frequency in two and three dimensions, (2) a surface wave device that uses a patterned thin film to filter waves of a single or range of frequencies, and (3) a fully three-dimensional structure to guide a wave generated by a harmonic input on a free surface to a specified output port on the surface. From the first to the third example, the resulting topologies increase in sophistication. The results demonstrate the power and promise of our computational framework to design sophisticated surface wave devices.