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Application of layout and topology optimization using pattern gradation for the conceptual design of buildings

机译:基于模式渐变的布局和拓扑优化在建筑物概念设计中的应用

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This paper explores the use of manufacturing-type constraints, in particular pattern gradation and repetition, in the context of building layout optimization. By placing constraints on the design domain in terms of number and variable size of repeating patterns along any direction, the conceptual design for buildings is facilitated. To substantiate the potential future applications of this work, examples within the context of high-rise building design are presented. Successful development of such ideas can contribute to practical engineering solutions, especially during the building design process. Examples are given to illustrate the ideas developed both in two-dimensional and three-dimensional building configurations.
机译:本文探讨了在建筑布局优化的背景下制造类型约束的使用,尤其是图案等级和重复的使用。通过在沿任何方向的重复图案的数量和可变大小方面对设计域施加约束,可以简化建筑物的概念设计。为了证实这项工作的潜在未来应用,在高层建筑设计的背景下提供了示例。这些想法的成功发展可以为实用的工程解决方案做出贡献,尤其是在建筑设计过程中。给出了示例以说明在二维和三维建筑配置中提出的想法。

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