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Analyzing issues for 300mm 'backend' lithography

机译:分析300毫米“后端”光刻的问题

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With 300mm wafer processing, expect to see a shift from conventional proximity aligners to more applications of 1x steppers for backend bump processing. While passe for leading-edge frontend applications, 1× steppers provide clear advantages for semiconductor manufacturing's backend, in cost of ownership, automation, and processing. Advantages include broadband exposure, superior automatic alignment, and overlay performance. The 2μm resolution capability of these tools is more than adequate for even difficult bump applications. In addition, these tools' low 0.16 NA provides a large depth of focus (5.0μm at the resolution limit of 2.0μm), which is useful in imaging thick resist.
机译:随着300mm晶圆处理的发展,人们有望看到从传统的接近对准器转向1x步进器在后端凸点处理中的更多应用。 1x步进器虽然适用于前沿前端应用,但在拥有,自动化和处理成本方面为半导体制造的后端提供了明显的优势。优势包括宽带曝光,出色的自动对准和叠加性能。这些工具具有2μm的分辨率,即使在困难的凹凸应用中也绰绰有余。此外,这些工具的低0.16 NA可以提供较大的聚焦深度(在2.0μm的分辨率极限下为5.0μm),这对于对厚抗蚀剂成像很有用。

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