SHOW REPORT

摘要

Exposure tools and resists for 157nm lithography are still very much in the laboratory; 193nm lithography is making some progress in broad development, perhaps slightly behind its anticipated learning curve, but workhorse 248nm lithography continues to make somewhat remarkable progress. These conclusions were outlined by the three lead papers (listed below) and others presented at Arch Chemicals's Microlithography Symposium Interface 2000, held late last year.