In situ endpoint control saves chemicals in wet processing

摘要

Investiqation of endpoint detection, usinq cost of owner- ship analysis, on a pre-lithography backside film-removal step helped to determine how the capital investment of an endpoint detection system affects the cost/good wafer equivalent. Results showed a 12.5% increase in throughput and 14% savings in process chemicals and consumables. These factors led to an overall reduction in the cost/good wafer equivalent of 10.4% — from $3.46/wafer to $3.10/wafer. The value of adding endpoint control is realized further when increased utilization requires additional tools.