Next-generation litho progress, innovative technologies at MRS

摘要

Steady progress in next-generation lithography, from resists for 193nm and 157nm systems to extreme ultraviolet (EUV) and ion projection lithography, was reported at the Materials Research Society (MRS) conference in Boston recently. Hundreds of reports covered a wide range of innovative technologies, including MEMS, nanofabri-cation methods, organic semiconductors, optical devices, FRAMS, silicon carbide and gallium nitride devices.