An evaluation of semiconductor-grade polysilicon furnace fixtures

摘要

Data show that polysilicon furnace fixtures can significantly reduce post-LPCVD process particle counts and the need for periodic furnace fixture cleaning, and increase wafer deposition rate. Thermal and purity characteristics of this material also help to reduce defect densities and metallic contamination on silicon wafers. These data have been developed from long-term evaluations at many major semiconductor manufacturers.