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Navigating yield through the maze of copper CMP defects

机译:通过迷宫铜CMP缺陷提高产量

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摘要

Many types of defects arise from the copper CMP step, and careful inspection and an understanding of the failure mechanisms allow processes to be modified to reduce the defect levels. Some of the defects that appear at copper CMP actually come from previous process steps, so the right inspection and analysis approach can improve entire process modules.
机译:铜CMP步骤会产生许多类型的缺陷,仔细检查和了解故障机理可以修改工艺以减少缺陷水平。铜CMP上出现的某些缺陷实际上来自先前的工艺步骤,因此正确的检查和分析方法可以改善整个工艺模块。

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