Symposium 2002: Progress in e-beam, 157nm

摘要

E-beam seems to look a lot better from the Japanese side of the Pacific. The approach shared attention with 157nm technology at Selete Symposium 2002, the consortium's annual update on the progress of its research, programs. While there is still an alarming divergence of opinion about the future direction of next-gen-eration lithography (NGL), Matsushita Process Techrtolosgy Center's Masaru Sasago's survey of Japanese NGL plans found nearly as much support for e-beam projection as tor F_2 technology for the 65nm node (see figure). The survey also found considerable hope still for the extension of ArF technology. I