Contact hole patterning

摘要

Reliable printing of sub-80nm contact holes is a challenge that manufacturers of state-of-the-art DRAM and MPU devices must overcome within the next few years. Step-and-flash imprint lithography (S-FIL) has already demonstrated the ability to resolve sub-30nm lines in previous studies. Here, the first commercially available step-and-repeat imprint tool is used to show the ability of S-FIL to repeatably print dense arrays of sub-80nm contact holes.