Removal of metal carbonyl and moisture impurities through POU purification of CO gas

摘要

An elaborate testing methodology is used to study the impurity removal characteristics of point-of-use carbon monpxide gas purifiers. Test results demonstrate efficient removal of impurities, such as harmful metal carbonyls and moisture, from carbon monoxide gas. In addition to reviewing those results, this article discusses how a unique purification technology would benefit certain wafer-processing applications such as plasma etch.