In situ monitoring of components to control dilute wet chemistries

摘要

Materials loss per cleaning cycle must be limited in advanced semiconductor process flows. Using dilute chemistries is necessary to achieve this goal. Fab engineers need to be able to analyze the concentrations of each component in processing solutions in real time to ensure that the chemistries are always in a narrowly defined process window. This article describes how multivariate methods can be applied to analyze chemistries of concentrations ranging from conventional to ultra-dilute levels.