High-power EUV lithography lightsources come of age

摘要

By the time EUVL is introduced into production, it is expected that the technology will meet all of the requirements of the commercial semiconductor capital equipment industry. Later systems for high-volume production are expected to operate with a source power above the 200W level. Further development and engineering of EUV sources is planned for many years to come, with progressively higher power and lower COO systems being delivered to support the roadmaps of both the scanner manufacturers and chipmakers through the next several device nodes.