Trio of 3X-2X inspection systems

摘要

KLA-Tencor has taken the wraps off three new tools for defect wafer inspection and review. In the 2835 brightfield inspection tool, a broadband illumination source allows selection of different wavelengths to suppress noise, or enhance the signal from defects; a redesigned laser-pumped plasma source makes the pattern brighter and improves contrast of pattern features.