SEMATECH outlines maskless issues, proposes consortium

摘要

Among key takeaways from SEM AT-ECH's Litho Forum in New York City in March was a proposal to create a consortium to support multibeam mask writing efforts, similar to what's being done for EUV.rnA maskless and multibeam workshop (cosponsored by TSMC and Leti) at the event reviewed technical and business aspects of maskless lithography (ML2) technologies both in relation to direct wafer imaging and as a solution for high-speed mask writers. Approximately 70 litho technologists, mask fabricators, equipment suppliers, and development and manufacturing managers hashed out discussions on current status, plans, and timelines.