SPIE roundup: EUV/EBMI demo, 11 nm NIL, the skinny on DOE

摘要

Several discussions and presentations at this year's SPIE Advanced Lithography Conference deserve special note-from work with e-beam EUV mask inspection, to nanoimprint achievements (11nm!), an EUV tool platform roadmap, mask productivity and cost issues at 22nm, and more on SMO and tunable DOEs.