Leveraging ion implant process characteristics to facilitate 22nm devices

摘要

Certain inherent process characteristics such as precision, cleanliness, control and high productivity have been the hallmark of the entire implant industry for some time. Coupled with new capability, implant has become less of a commodity product and more enabling. In fact, the makers of the industry's next-generation devices are looking to implant to improve established doping applications and facilitate new precision materials modification applications to provide device performance and yield improvements required for 22nm.