首页> 外文期刊>Solid state technology >Thin die stacking for wide I/O memory-on-logic
【24h】

Thin die stacking for wide I/O memory-on-logic

机译:薄裸片堆叠可实现逻辑上的I / O广泛存储

获取原文
获取原文并翻译 | 示例
       

摘要

Wide I/O interface memory-on-logic has the potential to be the long awaited killer application that will boost through silicon vias (TSVs) and 3D integration into high-volume manufacturing. Information transfer is rapidly transforming from text based communication to picture and video-based communication, which creates an insatiable demand for bandwidth. The convergence of smart phone and media server requires DRAM bandwidth >12GB/s in order to allow streaming of 1080p HD videos onto large displays. Conventional memory-logic interfaces ("narrow I/O interface") consume too much power at the input/outputs (I/Os) and do not allow scaling to multiple hundreds or thousands of I/Os. TSVs enable a significant power reduction at the I/O. Current DDR3 technology consumes 40mW per pin, whereas I/Os based on TSVs only consume 24 μW per pin [1]. This power reduction by 100 Ox gives chip designers the freedom to implement 512 I/Os with the next device generation.
机译:广泛的I / O接口逻辑上存储器有可能成为人们期待已久的杀手级应用,它将通过硅通孔(TSV)和3D集成到大批量生产中而得到提高。信息传输正迅速地从基于文本的通信转变为基于图片和视频的通信,这对带宽产生了无法满足的需求。智能电话和媒体服务器的融合要求DRAM带宽> 12GB / s,以便将1080p高清视频流传输到大型显示器上。常规的存储器逻辑接口(“窄I / O接口”)在输入/输出(I / O)上消耗过多功率,并且不允许扩展到成百上千个I / O。 TSV使I / O的功耗大大降低。当前的DDR3技术每个引脚消耗40mW的功率,而基于TSV的I / O每个引脚仅消耗24μW的功率[1]。这种功耗降低了100 Ox,使芯片设计人员可以自由地在下一代器件中实现512个I / O。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号