Resist coat and develop platforms

摘要

SUSS MicroTec launched the RCD8 manual resist coat and develop platform for R&D and low-volume use in micro electro mechanical system (MEMS), semiconductor packaging, light-emitting diode (LED) and other applications. The RCD8 can convert from a spin coater, with the proprietary GYRSET closed cover coating technology, to a spray developer. The convertion takes minutes. Install options range from basic manual operation to semi-automated to puddle & spray developer. Processes developed on the manual RCD8 are easily transitioned to a SUSS MicroTec production tool. The RCD8 combines SUSS' multiple dedicated Delta Series tools that served specific applications in MEMS, advanced packaging, and LED fab or the R&D market. AH necessary coating and developing processes for these applications are incorporated. SUSS MicroTec, Garching, Germany.