GLOBALFOUNDRIES unveils plans to accelerate adoption of 20nm-LPM and 14nm-XM finFET processes

摘要

At the 50th Design Automation Conference (DAC) in Austin, Texas, GLOBALFOUNDRIES unveiled a comprehensive set of certified design flows to support its most advanced manufacturing processes. The flows jointly developed with EDA providers, offer support for implementing designs in the company's 20nm low power process and its 14nm-XM finFET process. Working closely with Cadence Design Systems, Mentor Graphics and Synopsys, GLOBALFOUNDRIES has developed the flows to address the most pressing design challenges, including support for analog/mixed signal (AMS) design, and advanced digital designs, both with demonstration of the impact of double patterning on the flow.