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EUVL readiness for pilot line insertion

机译：EUVL准备插入试验管线

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Likewise, the next generation of mask blank inspection tools are needed by 2011 to support the final development roadmap requirements to meet HVM defect specifications, which typically follow two years after EUVL pilot line introduction. EUVL mask blank suppliers will need these tools to provide certified blanks with essentially no defects.
机译：同样，在2011年之前需要使用下一代口罩毛坯检测工具来满足最终开发路线图要求，以满足HVM缺陷规范，这通常是在EUVL试生产线推出两年之后进行的。 EUVL面罩毛坯供应商将需要这些工具来提供经过认证的毛坯，而这些毛坯基本上没有缺陷。

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  • 来源
    《Solid State Technology》 |2009年第2期|p.14-17|共4页
  • 作者

    S Wurm; F Goodwin; H Yun;

  • 作者单位

    S. Wurm, F. Goodwin, H.Yun, SEMATECH, Albany, NY USASTEFAN WURM received his doctorate in physics from the Technische Universität München, Germany. He is a principal member of technical staff at Advanced Micro Devices and the associate director of lithography at SEMATECH, 255 Fuller Road, Albany, NY 12203, USA;

    email stefan.wurm@sematech.org.FRANK GOODWIN received his masters in electrical engineering from Cornell University. He is a Senior Member of Technical Staff at SEMATECH.HENRY YUN received his PhD in materials science and engineering from the U. of Washington. He is a senior staff engineer at Intel Corporation currently on assignment to SEMATECH as mask strategy program manager.;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-17 13:43:31

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