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Hole energy levels in p-type δ-doped Si quantum wells

机译:p型δ掺杂Si量子阱中的空穴能级

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Electronic structure calculations in p-type B δ-doped Si quantum wells are carried out self-consistently and within the Thomas-Fermi approximation. The self consistent calculations assume both a two-independent (hh + lh) and a three independent (hh + lh + so) hole bands models. The numerically calculated spectra are compared between themselves and with experimental results, making emphasis on the effects of the inclusion of the so hole band. The Thomas-Fermi approach uses two different two-independent bands models: hh+ lh and hh+ so. Despite of the simplicity of this theory. comparison of the obtained results with experiments and self consistent theoretical calculations gives very good agreements. Again, the influence of the split-off band is highlighted and the relevance of the approximations assumed is discussed.
机译:p型Bδ掺杂的Si量子阱中的电子结构计算是自洽地并且在Thomas-Fermi近似范围内进行的。自洽计算假定两个独立的(hh + lh +)和三个独立的(hh + lh + so)孔带模型。数值计算的光谱之间进行了比较,并与实验结果进行了比较,从而着重强调了包含so空穴带的影响。 Thomas-Fermi方法使用两个不同的两个独立的波段模型:hh + lh和hh + so。尽管该理论很简单。将获得的结果与实验和自洽的理论计算进行比较,可以得出很好的一致性。再次强调了分离带的影响,并讨论了所假设近似值的相关性。

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