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Characterization of the properties of Mg-doped Al_0.15Ga_0.85N/GaN superlattices

机译:掺Mg的Al_0.15Ga_0.85N / GaN超晶格的特性表征

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摘要

Low resistivity Mg-doped Al_0.15Ga_0.85N/GaN strained-layer superlattices (SLs) were grown. In these SLs, the maximum hole concentration is 3 × 10~18 cm~-3 at room temperature, i.e., larger than those for Mg-doped Al_0.15Ga_0.85N and GaN bulk layers with the same Cp_2Mg flow rates during growth. Hall effect measurements indicate high con- ductivity of this structure in which the high activation efficiency is attributed to the strain-induced piezoelectric fields. In addition, photoluminescence measurements revealed a blue band at 2.9 eV in Mg-doped Al_0.15Ga_0.85N/GaN SLs, which could be attributed to a distant donor-to-acceptor transition feature. This work also fabricated InGaN/GaN blue light emitting diodes (LEDs) that consist of a Mg-doped Al_0.15Ga_0.85N/GaN SLs. Experimental results indicate that the LEDs can achieve a lower operation voltage of around 3 V, i.e., smaller than conventional devices which have an operation voltage of about 3.8 V.
机译:生长了低电阻率的掺Mg的Al_0.15Ga_0.85N / GaN应变层超晶格(SLs)。在这些SL中,室温下的最大空穴浓度为3×10〜18 cm〜-3,即比在生长期间具有相同Cp_2Mg流量的掺Mg的Al_0.15Ga_0.85N和GaN体层的空穴浓度更大。霍尔效应测量表明该结构的高电导率,其中高激活效率归因于应变感应的压电场。此外,光致发光测量结果显示,掺Mg的Al_0.15Ga_0.85N / GaN SLs中存在2.9 eV的蓝带,这可能是由于远距离的供体-受体过渡特征所致。这项工作还制造了由Mg掺杂的Al_0.15Ga_0.85N / GaN SL组成​​的InGaN / GaN蓝色发光二极管(LED)。实验结果表明,LED可以实现约3 V的较低工作电压,即比具有约3.8 V的工作电压的常规器件要小。

著录项

  • 来源
    《Solid-State Electronics》 |2001年第9期|p.1665-1671|共7页
  • 作者

    J.K.Sheu; C.H. Kuo; C.C. Chen;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 一般性问题;
  • 关键词

  • 入库时间 2022-08-18 01:36:28

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