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Electrical properties and deep levels in bulk solution grown GaAs crystal

机译:体溶液生长的GaAs晶体的电学性质和深能级

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Electrical and photoelectrical properties, deep levels spectra and microcathodoluminescence spectra were measured for bulk high-resistivity GaAs samples grown from Ga-rich solution by a synthesis solute diffusion technique. It is shown that the main portion of the grown crystal is high-resistivity p-type with electrical properties determined by deep hole traps with the level near 0.43 eV from the valence band edge. The density of these 0.43 eV hole traps was shown to decrease with increasing distance from the crystallization front and the traps were associated with the deep hole traps observed earlier in Ga-rich liquid-phase-epitaxy-grown films. The single crystalline end portion of the crystal was semi-insulating n-type with a very low (some 10~(14) cm~(-3)) concentration of midgap EL2 donors. This end portion of the crystal was characterized by a very high photosensitivity. Possible advantages of the use of such material in radiation detectors are briefly discussed.
机译:通过合成溶质扩散技术测量了从富含Ga的溶液中生长的块状高电阻率GaAs样品的电学和光电学性质,深能级光谱和微阴极发光光谱。结果表明,生长晶体的主要部分是高电阻率p型,其电性能由深的空穴陷阱决定,该陷阱的价位从价带边缘接近0.43 eV。这些0.43 eV空穴陷阱的密度随着距结晶前沿距离的增加而降低,并且与早期在富含Ga的液相外延生长膜中观察到的深空穴陷阱有关。晶体的单晶末端部分是半绝缘的n型,中间隙EL2供体的浓度非常低(约10〜(14)cm〜(-3))。晶体的该末端部分的特征在于非常高的光敏性。简要讨论了在辐射探测器中使用此类材料的可能优势。

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