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首页> 外文期刊>Solid-State Electronics >Weii width dependence for novel AlInAsSb/InGaAs double-barrier resonant tunneling diode
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Weii width dependence for novel AlInAsSb/InGaAs double-barrier resonant tunneling diode

机译:新型AlInAsSb / InGaAs双势垒共振隧穿二极管的Weii宽度依赖性

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摘要

The novel Al_0.66In_0.34As_0.85Sb_0.15/In_0.53Ga_0.47As heterostructure has a large conduction band offset (about 1 eV). Taking the advantage of high conduction-band offset, it has been demonstrated to be a potential candidate for double- Barrier resonant tunneling diodes (DBRTDs). Well width is an important parameter for the performance of a DBRTD. We fixed the barrier width and discussed the well width dependent for Al_0.66In_0.34As_0.85Sb_0.15/In_0.53Ga_0.47As DBRTD. Peak current densities exhibit a maximum at the 4 nm well width. A peak-to-valley current ratio of 46 with a peak Current density of 22 kA/Cm~2 at room temperature was demonstrated for the 4 nm-InGaAs-well.
机译:新颖的Al_0.66In_0.34As_0.85Sb_0.15 / In_0.53Ga_0.47As异质结构具有大的导带偏移(约1eV)。利用高导带偏移的优势,已证明它是双势垒共振隧穿二极管(DBRTD)的潜在候选者。井宽是DBRTD性能的重要参数。我们固定了势垒宽度,并讨论了取决于Al_0.66In_0.34As_0.85Sb_0.15 / In_0.53Ga_0.47As DBRTD的阱宽度。峰值电流密度在4 nm的阱宽度处显示出最大值。对于4 nm-InGaAs-阱,在室温下的峰谷电流比为46,峰值电流密度为22 kA / Cm〜2。

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