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Temperature effects of low noise InGaP/InGaAs/GaAs PHEMTs

机译:低噪声InGaP / InGaAs / GaAs PHEMT的温度效应

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The temperature-dependent DC characteristics and noise performance of In_(0.49)Ga_(0.51)P/In_(0.15)Ga_(0.85)As/GaAs low noise pseudomorphic high electron mobility transistors (PHEMTs) with the gate dimensions of 0.25x160 μm~2 are investigated at 12 GHz with temperature ranging from 300 to 450 K. It is found that the variation of the turn-on voltage for drain-to-gate Schottky diode is -1.05 mV/K and reverse voltages, which are measured at -0.5 mA/mm of gate current is -6 mV/K. The temperature-dependence of pinch-off voltage is -1.01 mV/K and leakage current is 0.043 μA/K. Comparisons of noise performance including minimum noise figure and associated gain between In_(0.49)Ga_(0.51)P/ In_(0.15)Ga_(0.85)As and Al_(0.25)Ga_(0.75)As/In_(0.15)Ga_(0.85)As low noise PHEMTs are also created. It is found that the high temperature performance of In_(0.49)Ga_(0.51)P/In_(0.15)Ga_(0.85)As PHEMT is much better than that of Al_(0.25)Ga_(0.75)As/ln_(0.15)Ga_(0.85)As due to the less effects of deep level traps by absence of deep-complex (DX)-center and lower leakage current by higher Schottky barrier and valence band discontinuity.
机译:栅极尺寸为0.25x160μm〜的In_(0.49)Ga_(0.51)P / In_(0.15)Ga_(0.85)As / GaAs低噪声拟态高电子迁移率晶体管(PHEMT)的温度相关直流特性和噪声性能图2在12 GHz下在300至450 K的温度范围内进行研究。发现漏极至栅极肖特基二极管的导通电压变化为-1.05 mV / K,反向电压在-下测得栅极电流0.5 mA / mm为-6 mV / K。夹断电压的温度依赖性为-1.01 mV / K,泄漏电流为0.043μA/ K。 In_(0.49)Ga_(0.51)P / In_(0.15)Ga_(0.85)As与Al_(0.25)Ga_(0.75)As / In_(0.15)Ga_(0.85)之间的噪声性能比较,包括最小噪声系数和相关增益由于还产生了低噪声的PHEMT。发现In_(0.49)Ga_(0.51)P / In_(0.15)Ga_(0.85)As PHEMT的高温性能远优于Al_(0.25)Ga_(0.75)As / ln_(0.15)Ga_的高温性能(0.85)由于缺乏深复合(DX)中心而对深能级陷阱的影响较小,并且由于较高的肖特基势垒和价带不连续性而导致的漏电流较低。

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