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首页> 外文期刊>Solid-State Electronics >Temperature dependency of MOSFET device characteristics in 4H- and 6H-silicon carbide (SiC)
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Temperature dependency of MOSFET device characteristics in 4H- and 6H-silicon carbide (SiC)

机译:4H和6H碳化硅(SiC)中MOSFET器件特性的温度依赖性

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摘要

The advantages of silicon carbide (SiC) over silicon are significant for high power and high temperature device applications. An analytical model for a lateral MOSFET that includes the effects of temperature variation in 6H-SiC poly-type has been developed. The model has also been used to study the device behavior in 4H-SiC at high ambient temperature. The model includes the effects of temperature on the threshold voltage, the carrier mobility, the body leakage current, and the drain and source contact region resistances. The MOSFET output characteristics and parameter values have been compared with previously measured experimental data. A good agreement between the analytical model and the experimental data has been observed. 6H-SiC material system provides enhanced device performance compared to 4H-SiC counterpart for lateral MOSFET.
机译:碳化硅(SiC)相对于硅的优势对于高功率和高温设备应用而言非常重要。已经开发出一种横向MOSFET的分析模型,该模型包括6H-SiC多晶硅类型中温度变化的影响。该模型还用于研究4H-SiC在高环境温度下的器件性能。该模型包括温度对阈值电压,载流子迁移率,体漏电流以及漏极和源极接触区电阻的影响。 MOSFET的输出特性和参数值已与先前测得的实验数据进行了比较。已经观察到分析模型与实验数据之间的良好一致性。与横向MOSFET的4H-SiC对应物相比,6H-SiC材料系统提供了增强的器件性能。

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