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Field emission of vertically-aligned carbon nanotube arrays grown on porous silicon substrate

机译:在多孔硅衬底上生长的垂直排列的碳纳米管阵列的场发射

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Vertically aligned arrays of multi-walled carbon nanotubes were grown by pyrolysis of acetylene on iron catalytic particles within a porous silicon template via chemical vapor deposition (CVD) at 700℃. Using this method ordered nanotubes with diameters from 75 to 100 nm could be produced. The diode configuration field emission of the CNT arrays were performed and the onset electric field is 4 V/μm and the emission current can approach 1 mA/cm~2 at a electric field of 9.5 V/μm. The enhancement factor of the CNT arrays (4012) is derived from the F-N plot of the experiment data. To demonstrate the uniformity of the field emission, an ITO glass substrate with phosphor coated is used as anode in the field emission experiment. The average fluctuation of the emission current density was less than 5%. The result shows that the field emission of the CNT arrays on the silicon substrate is very uniform. These carbon nanotube arrays are useful for applications in field emission displays and sensors. The fabrication method shows the feasibility of integration between carbon nanotube arrays and silicon microelectronics.
机译:通过在700℃下通过化学气相沉积(CVD)将乙炔在多孔硅模板内的铁催化颗粒上热解来生长垂直排列的多壁碳纳米管阵列。使用这种方法,可以生产直径为75至100 nm的有序纳米管。进行了CNT阵列的二极管构型场发射,起始电场为4 V /μm,在9.5 V /μm的电场下发射电流可以达到1 mA / cm〜2。 CNT阵列(4012)的增强因子是从实验数据的F-N图得出的。为了证明场发射的均匀性,在场发射实验中将涂有荧光粉的ITO玻璃基板用作阳极。发射电流密度的平均波动小于5%。结果表明,硅衬底上的CNT阵列的场发射非常均匀。这些碳纳米管阵列可用于场发射显示器和传感器。该制造方法表明了碳纳米管阵列和硅微电子之间集成的可行性。

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