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Normal distribution of confinement energy from a photoluminescence line shape analysis in oxidized porous silicon

机译:由光致发光线形分析得出的氧化多孔硅中禁闭能量的正态分布

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Photoluminescence (PL) spectra of oxidized porous silicon (PS) samples plotted against photon energy scale on x-axis would have pure Gaussian form or asymmetric form, depending on the conditions of preparation. At first a pure Gaussian-shape spectrum plotted against photon energy scale on x-axis is analyzed by statistical method on the assumption that the energy of emitted photon would be considered as a random variable simultaneously affected by two independent factors, namely: the statistical spread of wire width and the fluctuation in barrier height of SiO_x/Si structures. Comparison of visual plots and statistic characteristic between three spectra plotted against various variables (confinement energy, logarithmic wire width and wire width) scale on x-axis demonstrates the exact description of the spectrum by Gaussian profile using normal distribution of confinement energy. An expression correlating the PL intensity (the number of emitted photons) to the number of wires and quantum efficiency has been developed. Further this expression has been extended to the case of spectrum having asymmetric form, which corresponds to the emission from both wire and dot nano-structures. Thus, our model permits to calculate the structural and spectroscopic parameters such as proportion of wires and dots, integrated intensity, peak energy position, FWHM and standard deviation.
机译:相对于光子能级在x轴上绘制的氧化多孔硅(PS)样品的光致发光(PL)光谱将具有纯高斯形式或不对称形式,具体取决于制备条件。首先,在假设发射光子的能量将被视为同时受两个独立因素影响的随机变量的情况下,通过统计方法分析了在x轴上针对光子能量尺度绘制的纯高斯形谱。线宽和SiO_x / Si结构势垒高度的波动在x轴上针对各种变量(约束能量,对数导线宽度和导线宽度)标度绘制的三个光谱之间的视觉图和统计特性比较,证明了使用约束能量的正态分布通过高斯分布对光谱进行了精确描述。已经开发出使PL强度(发射的光子的数量)与导线的数量和量子效率相关的表达式。此外,该表达已经扩展到具有不对称形式的光谱的情况,其对应于来自线和点纳米结构的发射。因此,我们的模型可以计算结构和光谱参数,例如线和点的比例,积分强度,峰值能量位置,FWHM和标准偏差。

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