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Analytical non-linear charge control model for InAlAs/InGaAs/InAlAs double heterostructure high electron mobility transistor (DH-HEMT)

机译:InAlAs / InGaAs / InAlAs双异质结构高电子迁移率晶体管(DH-HEMT)的分析非线性电荷控制模型

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摘要

An analytical charge control model for sheet carrier density is presented for InAlAs/InGaAs/InAlAs double heterostructure high electron mobility transistor (DH-HEMT). The model uses a polynomial dependence of sheet carrier concentration on position of quasi-Fermi energy level to successfully predict the gradual saturation of charge in the device and is valid from subthreshold region to high conduction region for both the channels. The model has been extended to calculate I_d-V_d characteristics, transconductance and cut-off frequency of the device.
机译:针对InAlAs / InGaAs / InAlAs双异质结构高电子迁移率晶体管(DH-HEMT),提出了一种薄层载流子密度的电荷分析控制模型。该模型使用薄片载流子浓度对准费米能级位置的多项式依赖性来成功预测器件中电荷的逐渐饱和,并且对于两个通道从亚阈值区域到高导电区域都是有效的。该模型已扩展为计算器件的I_d-V_d特性,跨导和截止频率。

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