首页> 外文期刊>Solid-State Electronics >Optoelectronic characteristics of MEH-PPV polymer LEDs with thin, doped composition-graded a-SiC:H carrier injection layers
【24h】

Optoelectronic characteristics of MEH-PPV polymer LEDs with thin, doped composition-graded a-SiC:H carrier injection layers

机译:具有薄的,掺杂的,成分分级的a-SiC:H载流子注入层的MEH-PPV聚合物LED的光电特性

获取原文
获取原文并翻译 | 示例
       

摘要

The optoelectronic characteristics of poly(2-methoxy-5-(2'ethyl-hexoxy)-1,4-phenylene-vinylene) (MEH-PPV) polymer LEDs (PLEDs) have been improved by employing thin doped composition-graded (CG) hydrogenated amorphous silicon-carbide (a-SiC:H) films as carrier injection layers and O_2-plasma treatment on indium-tin-oxide (ITO) transparent electrode, as compared with previously reported ones having doped constant-optical-gap a-SiC:H carrier injection layers. For PLEDs with an n-type a-SiC:H electron injection layer (EIL) only, the electroluminescence (EL) threshold voltage and brightness were improved from 7.3 V, 3162 cd/m~2 to 6.3 V, 5829 cd/ m~2 (at a current density J = 0.6 A/cm~2), respectively, by using the CG technique. The enhancement of EL performance of the CG technique was due to the increased electron injection efficiency resulting from a smoother barrier and reduced recombination of charge carriers at the EIL and MEH-PPV interface. Also, surface modification of the ITO transparent electrode by O_2-plasma treatment was used to further improve the EL threshold voltage and brightness of this PLED to 5.1 V, 6250 cd/m~2 (at J = 0.6 A/cm~2). Furthermore, by employing the CG n[p]-a-SiC:H film as EIL [hole injection layer (HIL)] and O_2-plasma treatment on the ITO electrode, the brightness of PLEDs could be enhanced to 9350 cd/m~2 (at a J = 0.3 A/cm~2), as compared with the 6450 cd/m~2 obtained from a previously reported PLED with a constant-optical-gap n-a-SiCGe:H EIL and p-a-Si:H HIL.
机译:聚(2-甲氧基-5-(2'乙基-己氧基)-1,4-亚苯基-亚乙烯基)(MEH-PPV)聚合物LED(PLED)的光电特性已通过采用薄掺杂的成分渐变(CG)技术得到改善)氢化的非晶碳化硅(a-SiC:H)薄膜作为载流子注入层,并在铟锡氧化物(ITO)透明电极上进行O_2等离子体处理,与先前报道的掺杂恒定光学间隙a-的薄膜相比SiC:H载流子注入层。对于仅具有n型a-SiC:H电子注入层(EIL)的PLED,电致发光(EL)阈值电压和亮度从7.3 V,3162 cd / m〜2提高到6.3 V,5829 cd / m〜通过使用CG技术分别获得图2所示的电路板(在电流密度J = 0.6A / cm〜2时)。 CG技术的EL性能增强归因于更平滑的势垒以及EIL和MEH-PPV界面处的载流子重组减少,从而提高了电子注入效率。此外,通过O_2等离子体处理对ITO透明电极进行了表面改性,以进一步提高该PLED的EL阈值电压和亮度至5.1 V,6250 cd / m〜2(在J = 0.6 A / cm〜2时)。此外,通过将CG n [p] -a-SiC:H膜用作EIL [空穴注入层(HIL)]并在ITO电极上进行O_2-等离子体处理,可以将PLED的亮度提高到9350 cd / m〜。 2(在J = 0.3 A / cm〜2时),而先前报道的具有恒定光学间隙na-SiCGe:H EIL和pa-Si:H HIL的PLED则为6450 cd / m〜2 。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号