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Method of activation energy analysis and application to individual cells of 256Mb DRAM in 110 nm technology

机译:激活能分析方法及其在110 nm技术中应用于256Mb DRAM的单个单元的方法

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In DRAM every memory cell experiences an individual mixture of leakage currents which consume part of the stored charge and lead to a wide distribution of data retention time (t_(Ret)). This distribution consists of an intrinsic (main) and an extrinsic (tail) branch. In this work, the method of activation energy analysis on individual cells is introduced for retention tail characterization and explained in detail. The formalism of activation energies (E_a) provides information about the mechanisms involved. Activation energies of single cells in a 256M DDR memory chip and their dependence on negative gate bias (VNWLL) as well as body bias (VBB) have been investigated intensively for the first time. Worst tail cells - all within a small retention time interval - show a twofold and wide distribution of activation energies. The lower E_a distribution can be altered with VNWLL, whereas the higher E_a distribution only alters with VBB. Going from tail towards main distribution, the percentage of cells belonging to the low E_a part continuously decreases and finally disappears. We therefore conclude that a gate induced mechanism (GIDL) is the main component responsible for DRAM retention tail.
机译:在DRAM中,每个存储单元都会经历泄漏电流的单独混合,这些泄漏电流会消耗一部分存储的电荷并导致数据保留时间(t_(Ret))的广泛分布。此分布由一个内部(主)分支和一个外部(尾部)分支组成。在这项工作中,引入了对单个细胞进行活化能分析的方法以表征保留尾部,并对其进行了详细说明。活化能(E_a)的形式主义提供了有关所涉及机制的信息。 256M DDR存储芯片中单个单元的激活能量及其对负栅极偏置(VNWLL)和体偏置(VBB)的依赖性已得到首次深入研究。最差的尾电池-都在很小的保留时间内-表现出两倍的活化能分布。较低的E_a分布可以使用VNWLL更改,而较高的E_a分布仅可以使用VBB更改。从尾部到主分布,属于低E_a部分的细胞百分比不断减少,最后消失。因此,我们得出结论,门感应机制(GIDL)是负责DRAM保留尾部的主要组件。

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